|
[1]
|
J. J. Rocca, V. Shlyaptsev, F. G. Tomasel, et al. Demonstration of a discharge pumped table-top soft-X-ray laser. Physical Review Letters, 1994, 73(16): 2192-2195.
|
|
[2]
|
Y. P. Zhao, Y. L. Cheng, B. H. Luan, et al. Effects of capillary discharge current on the time of lasing onset of soft X-ray laser at low pressure. Journal of Physics D: Applied Physics, 2006, 39: 342-346.
|
|
[3]
|
张兴强, 程元丽, 王骐等. 延时对毛细管放电类氖氩46.9 nm软X射线激光的影响[J]. 中国激光, 2008, 35(3): 363-366.
|
|
[4]
|
X. Q. Zhang, Y. L. Cheng and Q. Wang. Characteristics of a Ne-like Ar 46.9-nm soft X-ray laser in capillary discharge at a low Ar pressure. Laser Physics, 2008, 18(8): 958-961.
|
|
[5]
|
张兴强, 程元丽, 王骐等. 主开关改进对毛细管放电软X光激光的影响[J]. 中国激光, 2009, 36(2): 324-327.
|
|
[6]
|
V. Bakshi, R. Lebert, B. Jagle, et al. Status report on EUV source development and EUV source applica-tions in EUVL. 23rd European Mask and Lithography Conference (EMLC), 2007, 6533: 653315-1-653315-11.
|
|
[7]
|
M. Yochioka, D. Bolshukhin, G. Hergenhan, et al. Progress on Xe-DPP source develop-ment for Alpha phase. Proceedings of SPIE, 2008, 6921: 69210U-1-69210U-6.
|
|
[8]
|
M. Corthout, R. Apetz, J. Brudermann, et al. Sn DPP source- collector modules: Status of alpha sources, beta development and the scalability to HVM. Proceedings of SPIE, 2008, 6921: 69210V-1-69210V-12.
|
|
[9]
|
T. Ceccotti. EUV lithography de-velopment in Europe: Present status and perspectives. Proceedings of SPIE, 2004, 5196: 57- 70.
|
|
[10]
|
张兴强, 程元丽, 王骐. 可用于极紫外光刻的三线毛细管的概念设计[J]. 中国激光, 2008, 35: 81-84.
|
|
[11]
|
程元丽. 毛细管放电类氖氩46.9 nm软X射线激光研究[D]. 哈尔滨工业大学工学, 2006, 3: 43-45.
|