二氧化硅光波导膜材料的制备工艺
Fabrication Process of Silica Film for Optical Waveguides
DOI: 10.12677/OE.2014.43006, PDF, HTML, 下载: 3,254  浏览: 12,843 
作者: 吴金东, 黄 舒, 胡海鑫：深圳市光纤传感工程技术研究开发中心，深圳；丁纲筋：T&S Communications Co. Ltd., Shenzhen；肖湘杰：深圳太辰光通信股份有限公司，深圳
关键词: 平面光波导；二氧化硅膜；等离子增强化学气相沉积；火焰水解沉积；Planar Lightwave Circuits； Silica Film； PECVD； FHD
摘要: 二氧化硅(SiO2)平面光波导器件在光通信和光传感的应用日益广泛，制备SiO2膜材料是平面光波导及其集成器件制作的基础。等离子增强化学气相沉积(Plasma Enhanced Chemical Vapor Deposition, PECVD)和火焰水解沉积(Flame Hydrolysis Deposition, FHD)工艺是制备SiO2厚膜的典型方法, 本文分析总结了制备工艺参数对膜层性能的影响，说明PECVD + FHD混合工艺是SiO2型PLC器件最具竞争性的制作方法。
Abstract: SiO2 based planar waveguide circuit device has found increasing application in optical communi-cation and optical sensing. The deposition of SiO2 thin film is the basis of fabricating PLC and inte-grated devices. PECVD (Plasma enhanced Chemical Vapor Deposition) and FHD (Flame Hydrolysis Deposition) are the typical techniques for depositing SiO2 thin film. In this paper, the influence of process parameters on thin film performance is discussed, showing that the hybrid process of PECVD and FHD is the most competitive way to fabricate PLC devices on SiO2 substrate.
文章引用：吴金东, 黄舒, 胡海鑫, 丁纲筋, 肖湘杰. 二氧化硅光波导膜材料的制备工艺[J]. 光电子, 2014, 4(3): 34-43. http://dx.doi.org/10.12677/OE.2014.43006

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