用分子束外延法生长的立方相Zn_xMg_1-xO薄膜的性质研究

Investigation of Cubic Zn_xMg_1-xO Films Grown by Molecular Beam Epitaxy

摘要: 通过分子束外延(MBE)的技术, 在富镁条件下于立方结构的MgO(100)衬底上外延生长立方相的Zn_xMg_1−xO薄膜。用反射高能电子衍射(RHEED)和X射线衍射(XRD)的方法研究了薄膜的晶体结构，结果表明，薄膜结构为四方相。用硬X射线吸收谱(XAS)的方法研究薄膜的电子结构，用透射谱的方法研究了薄膜的带隙结构；研究表明，Zn_xMg_1−xO薄膜中x的值约为0.58。

Abstract: The cubic Zn_xMg_1−xO films are prepared epitaxially on cubic MgO(100) substrates by Molecular Beam Epitaxy (MBE). The crystal structure is determined by Reflection High Energy Electron Di-fraction (RHEED) which indicates that the phase of the film is cubic structure, consistent with the observation of the X-ray diffraction (XRD) results. The electronic structure is studied by X-ray Ab-sorption Spectroscopy (XAS); the band-gap structure is demonstrated by transmission spectroscopy. It is indicated that the value of x in Zn_xMg_1−xO films is about 0.58.