《Physical Review Letters》

Bonding at the SiC-SiO2 Interface and the Effects of Nitrogen and Hydrogen

作者:
S WangS DharSR WangAC AhyiA Franceschetti

关键词:
conducting polymers polypyrrole benzenesulfonate voltammetry AFM quantum chemical modeling

摘要:
Unlike the Si - SiO 2 interface, the SiC - SiO 2 interface has large defect densities. Though nitridation has been shown to reduce the defect density, the effect of H remains an open issue. Here we combine experimental data and the results of first-principles calculations to demonstrate that a Si-C-O bonded interlayer with correlated threefold-coordinated C atoms accounts for the observed defect states, for passivation by N and atomic H, and for the nature of residual defects.

在线下载

相关文章:
在线客服:
对外合作:
联系方式:400-6379-560
投诉建议:feedback@hanspub.org
客服号

人工客服,优惠资讯,稿件咨询
公众号

科技前沿与学术知识分享