标题:
Fe/Ni多层薄膜尺寸效应的分子动力学模拟The Fe/Ni Multilayers Size Effects Simulation by Molecular Dynamics
作者:
吴勇芝, 陈尚达, 黄鸿翔
关键字:
Fe/Ni多层薄膜, 尺寸效应, 屈服应力, 分子动力学Fe/Ni Multilayers, Size Effects, Yield Stress, Molecular Dynamics
期刊名称:
《Hans Journal of Nanotechnology》, Vol.5 No.2, 2015-05-22
摘要:
本文采用分子动力学方法对BCC/FCC对接结构的Fe/Ni多层薄膜系统进行了模拟研究，通过改变薄膜的单层厚度来研究薄膜的尺寸效应，薄膜单层厚度的变化范围在6 nm~26 nm之间。模拟结果显示，随着Fe/Ni薄膜单层厚度的减小，屈服应力呈增加趋势，符合经典的Hall-Petch关系；当单层厚度减小到某一临界尺寸(10.6 nm~15.18 nm)后，Fe/Ni薄膜的屈服应力不再增加，在一定的范围内波动，当薄膜单层厚度进一步减小时，屈服应力呈减小的趋势，显示出反Hall-Petch关系。
In this article, molecular dynamics simulations were carried out to study the mechanical properties of fcc-bcc Ni-Fe Multilayer. The size effects were studied by changing the individual layer thickness, which varies from 6 to 26 nanometers. The simulation results show that the yield stress increased with the decreasing of thickness of single layer, which accords with the classic Hall-Petch relation. When the individual layer thickness decreases to a critical size (10.6 nm - 15.18 nm), the yield stress of Fe/Ni film does not increase again and shows a certain range of fluctuation. When the thickness of single-layer further reduced, the yield stress showed a trend of decreasing, which accords with the reverse Hall-Petch relation.