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J. Zaumseil, R. H. Friend and H. Sirringhaus. Spatial control of the recombination zone in an ambipolar light-emitting organic transistor. Nature Materials, 2006, 6(1): 69-74.

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  • 标题: 诱导层成膜对弱外延OTFT的影响The Influence of the Inducement Layer on WEG OTFT

    作者: 洪飞, 谭莉, 朱棋锋, 向长江, 郭晓东, 申剑锋

    关键字: 有机薄膜晶体管, 弱外延生长, p-6P, 酞菁化合物Organic Thin Film Transistor; Weak Epitaxy Growth; p-6P; Phthalocyanines

    期刊名称: 《Applied Physics》, Vol.2 No.4, 2012-10-31

    摘要: 采用弱外延生长(Weak Epitaxy Growth,WEG)的方法制备OTFTs,研究了不同衬底温度对诱导层p-6P生长形貌的影响,以及WEG-OTFTs器件特性与诱导层形貌的关系。另外,还研究了诱导层p-6P的厚度变化对WEG-OTFTs场效应迁移率的影响。研究发现随着p-6P厚度增加WEG-OTFTs的场效应迁移率是一个先上升后下降然后再上升再下降的过程。我们在诱导层p-6P的厚度2 nm,衬底温度180℃时得到了最大的OTFTs场效应迁移率1.03 cm2/Vs。 OTFTs (Organic Thin Film Transistor) were prepared by the method of WEG (Weak Epitaxy Growth). The effection of the growth morphology of p-6P at difference substrate temperature and the relationship between WEG- OTFTs device performance and the morphology of p-6P inducement layer, were investigated. Furthermore, OTFTs device performance depending on the thickness of p-6P inducement layer was disclosed. We found that as the p-6P thickness rose up continuously, the WEG-OTFTs mobility increased at first then decreased, and increased again and then deseased at last. The maximum field effect mobility we obtained was1.03 cm2/Vs at the conditions of p-6P layer thickness of 2 nm and the substrate temperature of 180˚C.

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