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http://dx.doi.org/10.1016/S0040-6090(96)09510-7
被以下文章引用:
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标题:
后退火对外延Eu0.5Ba0.5TiO3薄膜表面形貌的影响Post-Annealed Effects on Surface Topography of Eu0.5Ba0.5TiO3 Epitaxial Thin Films
作者:
顾经伟, 史志界
关键字:
Eu0.5Ba0.5TiO3薄膜生长, 后退火温度, 表面形貌Eu0.5Ba0.5TiO3Thin Film, Annealing Temperature, Surface Morphology
期刊名称:
《Applied Physics》, Vol.5 No.12, 2015-12-23
摘要:
本文利用脉冲激光沉积技术在(001)取向的SrTiO3基片上制备了外延Eu0.5Ba0.5TiO3薄膜。我们研究了后退火、微结构、表面形貌以及磁性质之间的关系。X射线衍射和卢瑟福背散射谱结果说明Eu0.5Ba0.5TiO3薄膜具有立方结构且化学计量比与块材一致。同时还发现改变后退火温度可以有效的调控薄膜晶格常数、表面粗糙度以及饱和波尔磁子的大小。
Epitaxial Eu0.5Ba0.5TiO3 thin films were deposited on (001) SrTiO3 substrates by pulsed laser deposition. The correlation between post-annealing, microstructure, surface topography and magnetic property was investigated. X-ray diffraction and Rutherford backscattering spectrometry measurements show that Eu0.5Ba0.5TiO3 thin films have a cubic structure and are stoichiometric. The variation of lattice constant, roughness and bohr magneton are strongly correlated with the anneal temperature.