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材料化学前沿  >> Vol. 2 No. 3 (July 2014)

直流磁控溅射功率对ITO薄膜光电学性能的影响
The Effects of DC Magnetron Sputtering Power on Electrical and Optical Properties of ITO Thin Films

DOI: 10.12677/AMC.2014.23007, PDF, HTML, 下载: 2,510  浏览: 7,527  科研立项经费支持

作者: 耿志挺, 何青：华北电力大学能源与动力学院，北京

关键词: ITO薄膜；直流磁控溅射；光电学性能；ITO Thin films； DC Reactive Magnetron Sputtering； Electrical and Optical Properties

摘要: 本实验的ITO薄膜样品是利用直流磁控溅射技术在玻璃基片上沉积而成的。通过改变溅射功率，研究不同溅射功率对ITO薄膜光电学性能的影响。经实验测试后发现：在实验给定的功率区间内，ITO薄膜的厚度随着溅射功率的增加而增加，而其电阻率及可见光透过率则随之降低。
Abstract: The experiment of ITO thin film samples was deposited on glass substrates by DC reactive magnetron sputtering. The effects of sputtering power on optical properties of ITO thin films were investigated. The results of several tests show that within the scope of the set of power, the increase of sputtering power leads to the increase of the thickness of the films, but the decrease of the resistivity and visible light transmittance of ITO thin films.

文章引用: 耿志挺, 何青. 直流磁控溅射功率对ITO薄膜光电学性能的影响 [J]. 材料化学前沿, 2014, 2(3): 43-48. http://dx.doi.org/10.12677/AMC.2014.23007