磁控溅射法制备的Ag纳米阵列研究

Preparation of Ag Nano-Array by Magnetron Sputtering Technique

摘要: 本文采用两步阳极氧化法得到了尺寸均匀，排列规则的多孔阳极氧化铝(AAO)，以AAO模板为掩膜，利用磁控溅射技术，在AAO模板上成功制备了线状Ag纳米阵列，AFM及EDX分析表明，Ag纳米线的直径与AAO的孔径相当，粗细均匀，约100 nm。根据选区AFM结果，我们讨论了AAO模板孔洞内Ag纳米线的生长机理。实验表明，借助AAO模板，通过磁控溅射的方法可以很方便的制备类似的量子点及金属纳米阵列材料。这种结合AAO模板方法的技术，扩展了纳米阵列材料的应用范围，为生产银纳米阵列材料提供了可行的制备工艺。

Abstract: Ag nano-arrays have been successfully prepared by magnetron sputtering on/in anodic aluminum oxide (AAO) template. These nano-arrays have order rule and uniform diameter of approximate 100 nm, closely resemble those of AAO. The micrographs and composition of Ag nano-arrays are studied by Atomic Force Microscope (AFM) and Energy Dispersive X-Ray Fluorescence Spectrometer (EDX). The growth mechanism of Ag nano-arrays has been discussed according to the AFM images. The AFM, as well as EDX results clearly indicated that, by the aid of AAO template, metal quantum dots and nanowire arrays can be grown by the magnetron sputtering technique. This method of combining with AAO template broadened the application of the nano-array materials, and provided the possibility of commercial manufacture of silver nano-array.