外加磁场对纳米镍膜电磁屏蔽性能的影响

The Effect of External Magnetic Field on the Electromagnetic Shielding Performance of Nanometer Nickel Film

摘要: 用磁控溅射在柔性衬底上制备金属镍纳米薄膜，研究了磁场对薄膜样品的形貌的影响，分析了在有无磁场条件下制备的薄膜样品的X衍射，饱和磁化强度和矫顽力以及在电磁波频段为3.95~5.85 GHz内的电磁屏蔽效果。结果表明，在磁场条件下的制备的薄膜样品要比无磁场条件下制备的薄膜的结晶性好；有外加磁场下制备的薄膜矫顽力为112.89 Oe，无外加磁场条件下制备的薄膜的矫顽力为14.82 Oe，外加磁场下制备的薄膜矫顽力要比无外加磁场条件下制备的薄膜的矫顽力增加7.6倍。磁场下生长的薄膜样品的屏蔽效果明显优于无磁场下薄膜的屏蔽效果，屏蔽效能平均值提高了30%。

Abstract: Nickel nanometer thin films were deposited by magnetron sputtering on flexible substrates, the impact of morphology of the film sample of magnetic field, under magnetic and no magnetic of film were investigated by X-ray diffraction. A comparison of their saturation magnetization and coercive force as well as in the electromagnetic spec-trum for 3.95 - 5.85 GHz electromagnetic shielding effect. The result show that, the film of crystallinity was deposited under magnetic field is better than this no magnetic, the coercivity of the film was prepared under magnetic field is 112.89 Oe, while be prepared under no magnetic field is 14.82 Oe; the film be prepared under an external magnetic field is as 7.6 times no magnetic. The shielding effect of film sample under magnetic field is obviously better than that of no magnetic field, the average increase of shielding effectiveness is 30%.