极紫外光刻掩模缺陷暗场检测系统优化设计
Optimization Design of Dark Field Detection System for Mask Defects of Extreme Ultraviolet Lithography
摘要: 为了确保基于Schwarzschild结构的极紫外光刻掩模缺陷检测系统的成像质量，本文应用等效工作面法对其进行了优化设计。将传统光学设计方法得到的Schwarzschild放大系统的优化设计反射面视为由多层膜和裸镜面形共同构成，应用多层膜的等效工作面法反演出最佳裸镜面形。设计结果表明，考虑多层膜的Schwarzschild非球面系统全视场调制传递函数达到衍射极限水平，系统两裸镜的最大面形梯度分别为5.9 μm和10.2 μm，适合检测和加工。本文为添加多层膜的光学成像系统能够达到衍射极限水平提供了一种具有较强实用性的设计方法，避免了多层膜严重降低系统成像质量的问题。
Abstract: In order to ensure the image quality of mask defects detection system based on Schwarzschild structure for extreme ultraviolet lithography, the equivalent working surface model is used to optimize the optical design. The optimal reflector of Schwarzschild amplification system obtained by traditional optical design method is regarded as the combination of multilayers and bare mirror surface, and the optimal bare mirror surface is obtained by using equivalent working surface model of multilayers. The design results show that the full field modulation transfer function of the Schwarzschild aspheric system with multilayers reaches the diffraction limit level, and the maximum surface gradient of the two bare mirrors is 5.9 μm and 10.2 μm, respectively, which is suitable for the system detection and processing. We provided a practical design method for the optical im-aging system with multilayers to reach the diffraction limit level, and our method avoids the problem that the imaging quality of the ideal system is seriously reduced by the multilayers.
文章引用：刘馨泽, 匡尚奇, 刁金玉, 林景全. 极紫外光刻掩模缺陷暗场检测系统优化设计[J]. 应用物理, 2021, 11(3): 146-157. https://doi.org/10.12677/APP.2021.113017

参考文献

[1] Polkovnikov, V.N., Chkhalo, N.I., Pleshkov, R.S., et al. (2019) Stable High-Reflection Be/Mg Multilayer Mirrors for Solar Astronomy at 30.4 nm. Optics Letters, 44, 263-266. [Google Scholar] [CrossRef] 
[2] Feng, J., Huang, Q., Qi, R., et al. (2019) Stability of Cr/C Multilayer during Synchrotron Radiation Exposure and Thermal An-nealing. Optics Express, 27, 38493-38508. [Google Scholar] [CrossRef] 
[3] Rasulov, R.Y., Rasulov, V., Mamadalieva, N., et al. (2020) Subbarrier and Overbarrier Electron Transfer through Multilayer Semiconductor Struc-tures. Russian Physics Journal, 63, 537-546. [Google Scholar] [CrossRef] 
[4] 姚广宇, 李艳丽, 孔祥东, 等. 聚焦离子束切割法制备多层膜X射线波带片[J]. 微纳电子技术, 2019, 56(4): 314-318.
[5] Chang, W.S., Yook, Y.G., You, H.S., et al. (2020) A Unified Semi-Global Surface Reaction Model of Polymer Deposition and SiO2 Etching in Fluorocarbon Plasma. Applied Surface Science, 515, Article ID: 145975. [Google Scholar] [CrossRef] 
[6] Saedi, M., Sfiligoj, C., Verhoeven, J., et al. (2020) Effect of Rubidium Incorporation on the Optical Properties and Intermixing in Mo/Si Multilayer Mirrors for EUV Lithography Applications. Applied Surface Science, 507, Article ID: 144951. [Google Scholar] [CrossRef] 
[7] 刘陌, 李艳秋. 组合倍率极紫外光刻物镜系统梯度膜设计方法[J]. 光学学报, 2020, 40(5): 0522001.
[8] 李冠楠, 刘立拓, 周维虎, 等. 缺陷对极紫外掩模多层结构反射场的扰动研究[J]. 半导体光电, 2020, 41(2): 217-222.
[9] 宋源, 卢启鹏, 龚学鹏, 等. 极紫外光刻机多层膜反射镜表面碳污染的清洗[J]. 光学精密工程, 2017, 25(11): 2835-2844.
[10] 成维, 李思坤, 王向朝, 等. 极紫外光刻掩模相位型缺陷的形貌重建方法[J]. 光学学报, 2020, 40(10): 1005001.
[11] Weiss, M.R., Hellweg, D., Peters, J.H., et al. (2014) Actinic Review of EUV Masks: First Re-sults from the AIMS EUV System Integration. Extreme Ultraviolet (EUV) Lithography V, San Jose, 24-27 February 2014, 90480X. [Google Scholar] [CrossRef] 
[12] Kumar, N., Nezhdanov, A.V., Smertin, R.M., et al. (2020) Phase-Microstructure of Mo/Si Nanoscale Multilayer and Intermetallic Compound Formation in Interfaces. Intermetallics, 125, Article ID: 106872. [Google Scholar] [CrossRef] 
[13] Suman, M., Pelizzo, M.G., Windt, D.L., et al. (2008) Innova-tive Design of EUV Multilayer Reflective Coating for Improved Spectral Filtering in Solar Imaging. International Con-ference on Space Optics—ICSO, Volume 10566, Article ID: 1056667.
[14] 梅雪峰, 匡尚奇, 谢耀. 量子进化算法在极紫外多层膜表征和设计中的应用[J]. 长春理工大学学报(自然科学版), 2016, 39(4): 1-7.
[15] 宗楠, 胡蔚敏, 王志敏, 等. 激光等离子体13.5 nm极紫外光刻光源进展[J]. 中国光学, 2020, 13(1): 28-42.
[16] Abharana, N., Biswas, A., Sarkar, P., et al. (2019) Interface Studies of Mo/Si Multilayers with Carbon Diffusion Barrier by Grazing Incidence Extended X-Ray Absorption Fine Structure. Thin Solid Films, 673, 126-135. [Google Scholar] [CrossRef] 
[17] Sakhonenkov, S.S., Filatova, E.O., Gaisin, A.U., et al. (2019) Angle Resolved Photoelectron Spectroscopy as Applied to X-Ray Mirrors: An in Depth Study of Mo/Si Multilayer Systems. Physical Chemistry Chemical Physics, 21, 25002-25010. [Google Scholar] [CrossRef] 
[18] 张超, 张杰瑞, 王一名, 等. 基于量子进化算法的宽角度极紫外多层膜设计[J]. 光学学报, 2017, 37(6): 0631001.
[19] Bal, M.F., Singh, M. and Braat, J.J. (2004) Optimization of Multilayer Reflectors for Extreme Ultraviolet Lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 3, 537-545. [Google Scholar] [CrossRef] 
[20] 王君, 金春水, 王丽萍, 等. 极紫外光刻投影物镜中多层膜分析模型的建立及应用[J]. 光学学报, 2014, 34(8): 0811002.
[21] 李向阳. 金属/介质膜系光电特性的研究[D]: [硕士学位论文]. 西安: 西安工业大学, 2012.
[22] 蒙庆华, 梁志铭, 郑荣江. Matlab环境下多层光学薄膜的数值计算[J]. 广西师范学院学报(自然科学版), 2010, 27(3): 37-39.
[23] 巩盾, 王红. 含有自由曲面的大视场低畸变同轴三反射光学系统设计[J]. 光学学报, 2014, 34(7): 0722001.
[24] 谷茜茜, 崔占刚, 亓波. 基于离轴自由曲面的激光通信光学天线设计[J]. 中国光学, 2020, 13(3): 547-557.

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