一种基于光致变色材料的超分辨加工技术
A Super-Resolution Fabrication Technique Based on Photochromic Material
DOI: 10.12677/APP.2018.86033, PDF,   
作者: 李青格乐*, 吕 肃：深圳中科飞测科技有限公司，广东 深圳；吴 晓：浙江外国语学院科学技术学院，浙江 杭州
关键词: 超分辨；纳米加工；光刻技术；Super-Resolution； Nano-Fabrication； Optical Lithography
摘要: 本文提出了一种新的基于材料光致变色特性来制造超高分辨率纳米结构技术。这种方法可以大大简化目前复杂的超高分辨率加工配置。同时，通过理论模拟圆环光束的大小对聚焦区域光强分布的影响，发现当环状聚焦光大小为60 nm，光致变色层厚度为0.1 µm时可以实现87 nm的“纳米刻针”系统。
Abstract: In this work, we present a new technique for super-resolution nano-fabrication technique based on optical property of photochromic material. This work has been greatly simplified the traditional complex optical lithography process. The numerical calculation shows that the writing beam has only 87 nm size in photoresist (nano-pointer) after being modulated by 0.1 µm thickness with 60 nm diameter of photochromic thin layer.
文章引用：李青格乐, 吕肃, 吴晓. 一种基于光致变色材料的超分辨加工技术[J]. 应用物理, 2018, 8(6): 269-274. https://doi.org/10.12677/APP.2018.86033

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