厚度对Ni-Nb薄膜结构和光学性能的影响
Influence on the Structure and Optical Properties of Ni-Nb Thin Films Based on Thickness
DOI: 10.12677/MP.2018.84023, PDF,    科研立项经费支持
作者: 崔恒煕*, 魏 一：保定市第一中学，河北 保定；陈永亮, 张 轩, 高 洁, 宋建民*：河北农业大学理学院，河北 保定
关键词: 偏轴磁控溅射法；光学性能；镍-铌薄膜；Bias Magnetron Sputtering； Optical Property； Ni-Nb Thin Film
摘要: 采用偏轴磁控溅射法在玻璃基底上制备了70 nm、140 nm和210 nm厚度的Ni-Nb薄膜。利用紫外-可见分光光度计、X射线衍射(XRD)和原子力显微镜(AFM)对薄膜的光学特性，晶体结构和表面形貌进行了表征与分析。投射和反射光谱表明140 nm厚度的Ni-Nb薄膜具有优异的光学性能。XRD结果表明Ni-Nb薄膜为非晶态结构。AFM图片显示出Ni-Nb薄膜均匀致密，均方粗糙度仅为1.70 nm。
Abstract: Ni-Nb films with 70 nm, 140 nm and 210 nm in thickness were fabricated on glass substrates by off-axis magnetron sputtering. The optical properties, crystal structure and surface morphology of the films were characterized by UV VIS spectrophotometer, X-ray diffraction (XRD) and atomic force microscopy (AFM). The XRD results show that the Ni-Nb film is amorphous. The AFM images show that the Ni-Nb films have uniform and dense microstructure with mean roughness of 1.70 nm. The projection and reflectance spectra indicate that Ni-Nb thin film with 140 nm exhibits excellent optical properties.
文章引用：崔恒煕, 魏一, 陈永亮, 张轩, 高洁, 宋建民. 厚度对Ni-Nb薄膜结构和光学性能的影响[J]. 现代物理, 2018, 8(4): 198-203. https://doi.org/10.12677/MP.2018.84023

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