MgO(110)上ZnO薄膜的外延生长及其结构特性
Structural Properties of ZnO Thin Films Grown on MgO(110) Substrates by Molecular Beam Epitaxy
DOI: 10.12677/MS.2019.95059, PDF,   
作者: 袁学斌, 耿 伟, 王小丹, 周 华：厦门大学物理系，福建省半导体材料及应用重点实验室，福建 厦门
关键词: 氧化锌；氧化镁；AFM；XRD-极图；Zinc Oxide； Magnesium Oxide； AFM； XRD-Pole Figures
摘要: 本文着重研究六方ZnO薄膜和立方MgO衬底之间的耦合，利用分子束外延法(MBE)在MgO(110)衬底上生长ZnO薄膜，通过原子力显微镜(AFM)表征其表面形貌，并采用紫外可见光谱(UV-VIS)研究了其光学性质，X射线衍射(XRD)用于研究生长特性和界面结构。我们的工作表明，薄膜以三维模式生长，表面平整度受到生长氧分压的影响，并且氧分压的改变会导致ZnO薄膜的生长取向的改变。由于薄膜与衬底间晶格失配较大，在240℃，1.0 × 10−3 Pa的条件下生长出了较为平整的(1013)取向的薄膜，而不是通常的c轴择优取向。
Abstract: In this work, the coupling between hexagonal ZnO thin film and cubic MgO substrate was studied. ZnO films were deposited on MgO(110) substrates using oxygen plasma-assisted molecular beam epitaxy (MBE). Their surface morphology was probed by atomic force microscopy (AFM). Ultravi-olet-visible spectroscopy (UV-VIS) was carried out to study the optical properties and X-ray dif-fraction (XRD)-pole figures were depicted to investigate the growth characteristics and interfacial structures. Our work shows that the film growth was found to follow a three-dimensional growth mode and the surface morphologies could be monitored by the oxygen pressure in different growth conditions. Indeed, under various oxygen partial pressures, the deposited ZnO films have shown different orientations. Due to the large lattice mismatch between the film and the substrate, a relatively flat (1013) oriented film was grown at 240˚C, 1.0 × 10−3 Pa instead of the usual c-axis preferred orientation.
文章引用：袁学斌, 耿伟, 王小丹, 周华. MgO(110)上ZnO薄膜的外延生长及其结构特性[J]. 材料科学, 2019, 9(5): 466-472. https://doi.org/10.12677/MS.2019.95059

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