硅掺杂对圆柱形硬质合金基体表面金刚石薄膜生长的影响
Effect of Silicon Doping on Diamond Films Depositing on Cylindrical Cemented Carbide Substrates
DOI: 10.12677/MS.2019.98099, PDF,    科研立项经费支持
作者: 张建国*：东华大学，机械工程学院，上海
关键词: 金刚石薄膜；硬质合金；附着强度；硅掺杂；Diamond Films； Co-Cemented Carbide； Adhesive Strength； Silicon Doping
摘要: 硬质合金基体与金刚石薄膜的附着强度是影响涂层产品性能的重要因素。为提高薄膜与基体的附着强度，本文利用正硅酸乙酯为硅源，采用热丝化学气相沉积方法，在圆柱形硬质合金基体制备硅掺杂金刚石薄膜。利用机械抛光法，对比分析硅掺杂与普通金刚石涂层与硬质合金基体的附着强度。结果表明，硅掺杂可以显著提高金刚石薄膜与硬质合金基体的附着强度，硅元素在金刚石薄膜沉积过程中，还可以细化金刚石的晶粒。为制备高附着强度的细晶粒金刚石薄膜提供一种重要方法。
Abstract: The adhesive strength has the great effect on the properties of diamond coated Co-cemented car-bide (WC-Co) substrates. In order to improve the adhesive strength between the films and sub-strates, the silicon-doped diamond films are deposited on the cylindrical substrates by hot filament chemical vapor deposition using tetraethyl orthosilicate as silicon source. The adhesive strength between diamond films and substrates is analyzed using mechanical polishing method. The results show that the silicon doping can significantly improve the adhesive strength between the diamond films and substrates. The silicon element can also refine the diamond grains during the depositing process, which provides a method for preparing the diamond films with fine grains and high adhesive strength on WC-Co substrates.
文章引用：张建国. 硅掺杂对圆柱形硬质合金基体表面金刚石薄膜生长的影响[J]. 材料科学, 2019, 9(8): 795-802. https://doi.org/10.12677/MS.2019.98099

参考文献

[1] Mohr, M., Daccache, L., Horvat, S., Brühne, K., Jacob, T. and Fecht, H.J. (2017) Influence of Grain Boundaries on Elasticity and Thermal Conductivity of Nanocrystalline Diamond Films. Acta Materialia, 122, 92-98.
[2] Abreu, C.S., Amaral, M., Oliveira, F.J., Fernandes, A.J.S., Gomes, J.R. and Silva, R.F. (2006) Enhanced Performance of HFCVD Nanocrystalline Diamond Self-Mated Tri-bosystems by Plasma Pretreatments on Silicon Nitride Substrates. Diamond & Related Materials, 15, 2024-2028.
[3] 王新昶, 王成川, 孙方宏, 沈彬. HFCVD金刚石薄膜涂层小孔径拉丝模的制备及应用研究[J]. 超硬材料工程, 2017, 29(1): 35-42.
[4] 邓全, 满卫东, 杨自立, 刘伟, 易剑, 江南. 去Co深度及薄膜厚度对金刚石薄膜-硬质合金附着力的影响[J]. 硬质合金, 2018, 35(2): 86-94.
[5] 卢文壮. CVD金刚石涂层刀具的制备及其切削性能研究[D]: [博士学位论文]. 南京: 南京航空航天大学, 2008.
[6] Wang, T., Xiang, L., Shi, W. and Jiang, X. (2011) Deposition of Diamond/β-SiC/Cobalt Silicide Composite Interlayers to Improve Adhesion of Diamond Coating on WC-Co Substrates by DC-Plasma Assisted HFCVD. Surface and Coatings Technology, 205, 3027-3034.
[7] 王传新, 汪建华, 满卫东, 马志斌, 王升高, 康志成. 采用WC过渡层增加金刚石薄膜附着力的研究[J]. 金刚石与磨料磨具工程, 2003(3): 46-48.
[8] Cremer, R., Mertens, R., Neuschütz, D., Lemmer, O., Frank, M. and Leyendecker, T. (1999) Formation of Intermetallic Cobalt Phases in the Near Surface Region of Cemented Carbides for Improved Diamond Layer Deposition. Thin Solid Films, 355-356, 127-133. [Google Scholar] [CrossRef] 
[9] Polini, R. and Barletta, M. (2008) On the Use of CrN/Cr and CrN Interlayers in Hot Filament Chemical Vapour Deposition (HF-CVD) of Diamond Films onto WC-Co Substrates. Diamond and Related Materials, 17, 325-335.
[10] 陈孟杰, 李海宁, 王兵, 熊鹰, 冯真, 程永朋. 硼掺杂对单晶金刚石薄膜结构及生长的影响[J]. 稀有金属, 2018, 42(12): 65-71.
[11] 薛海鹏, 卢文壮, 孙达飞, 王浩, 王正鑫, 左敦稳. 纳米化学气相沉积金刚石的拉曼光谱[J]. 中国激光, 2013, 40(7): 136-141.

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