一种应用于光学临近修正过程中的异常图像识别方法
Abnormal Image Identification Method Used for Optical Proximity Correction
DOI: 10.12677/JISP.2019.84027, PDF,   
作者: 柯顺魁：上海华力集成电路制造有限公司，上海
关键词: OPC；异常图像；数据；芯片制造；OPC； Abnormal Image； Data； Chip Manufacturing
摘要: 为有效解决光学临近修正中的异常图片处理效率低的问题，本文建立一种可应用于芯片制造光学临近修正过程中的异常图像识别方法，能实现自动化的异常图像识别和异常数据过滤，从而有效减少了工程师人工经验干预，既保障了数据采集的有效性。
Abstract: In order to solve the bad performance for the image in the optical proximity correction, in this paper, a solution can be applied in micro chip manufacturing process which was introduced. It can automatically identify abnormal image and filter bad performance data to save a lot of engineering intervene and prevent the data validation.
文章引用：柯顺魁. 一种应用于光学临近修正过程中的异常图像识别方法[J]. 图像与信号处理, 2019, 8(4): 215-220. https://doi.org/10.12677/JISP.2019.84027

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