一种基于光学临近修正建模方法的光刻机台匹配方法
Litho Tool Matching Method Used for Optical Proximity Correction Modeling Method
DOI: 10.12677/IaE.2019.74028, PDF,   
作者: 柯顺魁：上海华力集成电路制造有限公司，上海
关键词: OPC；光刻机台匹配；焦距模糊扰动；光刻工艺；OPC； Litho Tool Matching； Blurred Focus Turbulence； Litho Process
摘要: 先进工艺技术节点的光学临近效应修正(Optical Proximity Correction, OPC)及其依赖光刻机和光刻工艺的属性，导致经OPC修正后的掩模板难以在不同型号的光刻机之间转移。针对该问题，本文充分考虑光刻机台的焦距模糊扰动对光刻机台的匹配影响，建立可应用于焦距模糊扰动条件下的光刻机台的匹配方法，以期提高光刻工艺在不同机台上的光刻机台匹配效率。
Abstract: Optical Proximity Correction for the advanced process technology node and its properties for the Litho tools and Litho process, which lead to difficulties in transmission masks for different Litho tools. Focus on this problem, this article fully concerned on Litho tools blurred focus turbulence to the Litho tools matching problem and applied tool matching method under blurred focus turbulence. By doing this, the masks transmission between different Litho tools can be efficiency improved.
文章引用：柯顺魁. 一种基于光学临近修正建模方法的光刻机台匹配方法[J]. 仪器与设备, 2019, 7(4): 207-211. https://doi.org/10.12677/IaE.2019.74028

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