复杂光滑曲面的磁射流工具磁场优化
Magnetic Field Optimization of Magnetorheological Jet Polishing Tool for Complex Smooth Surfaces
DOI: 10.12677/MET.2019.86050, PDF,  被引量    科研立项经费支持
作者: 胡 敏, 冯云鹏, 程灏波*:北京理工大学深圳研究院,广东 深圳;北京理工大学光电学院光机电工程联合研究中心,北京;王钟瑛, 杨 昊:北京理工大学深圳研究院,广东 深圳
关键词: 磁射流抛光技术磁场优化复杂光滑曲面Magnetorheological Jet Polishing Magnetic Field Optimization Complex Smooth Surfaces
摘要: 磁射流抛光技术在对复杂光滑曲面的加工上具有传统抛光技术无可比拟的优势。本文对磁射流抛光技术的工艺参数进行了研究,包括喷头体的结构参数和磁场优化。根据磁射流加工机理和电磁学相关理论,仿真分析得到当电磁线圈选定时合适的工艺参数为:锥角40˚、喷嘴台面半径3 mm和喷头嵌入深度为线圈高度1/2。通过比较磁场束缚下抛光液在不同距离的材料去除效果,说明了其加工过程中的距离稳定性和时间稳定性。对不同面型和材料的加工效果研究,验证了工艺参数优化的合理性,扩展了磁射流抛光技术的应用范围。
Abstract: Magnetorheological jet polishing (MJP) technique has incomparable advantages in the processing of complex smooth surfaces. In this paper, we study the technological parameters of MJP, which include the structural parameters and magnetic field optimization in the nozzle. According to the machining mechanism of MJP and the theories of electromagnetism, it’s found by simulation anal-ysis that the appropriate technological parameters are: the cone angle is 40˚, the radius of nozzle surface is 3 mm, and the embedding depth of nozzle is 1/2 height of the coil, when the electro-magnetic coil is selected. Simultaneously, the rationality of selected parameter is proved by ex-periment. The stability of the liquid column of distance and time in processing is explained by comparing the removal effects of the slurry under magnetic field at different distances. Subse-quently, by studying the processing effect of MJP for different type and material surfaces, the ra-tionality of technological parameters optimized is verified, and the application range of MJP is ex-tended.
文章引用:胡敏, 冯云鹏, 王钟瑛, 杨昊, 程灏波. 复杂光滑曲面的磁射流工具磁场优化[J]. 机械工程与技术, 2019, 8(6): 431-440. https://doi.org/10.12677/MET.2019.86050

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