图案化蓝宝石衬底的制备方法及关键技术分析
Study of the Preparation Methods and Key Techniques of Patterned Sapphire Substrate
DOI: 10.12677/MS.2020.101009, PDF,   
作者: 赖志远, 张江涛, 胡中伟*：华侨大学制造工程研究院，福建 厦门；仇凯弘, 侯 想：福建中晶科技有限公司，福建 龙岩
关键词: 图案化蓝宝石衬底；氮化镓；掩膜；刻蚀；Patterned Sapphire Substrate； Gallium Nitride (GaN)； Mask； Etching
摘要: 图案化蓝宝石衬底(Patterned Sapphire Substrate，PSS)是近几年来发展起来的一种用于提高LED出光率的新技术。本文就图案化蓝宝石衬底提高GaN基LED出光率的作用原理、表面微结构(几何形状及尺寸)对LED发光效率的影响以及图案化衬底制备的关键技术进行了分析，包括掩膜的制备和图形的转移技术，以及蓝宝石图案化衬底制备的两种主要方法：干法刻蚀和湿法腐蚀，并比较了这两种制备方法的优缺点，最后指出纳米级图案化蓝宝石衬底是未来的重点发展方向。
Abstract: The patterned sapphire substrate (PSS) is a new technology developed in recent years to improve the luminous rate of LED. This paper mainly introduces the principle of patterned sapphire sub-strate to improve the light-emitting rate of GaN-based LED, the effect of surface microstructure (geometry and size) on the luminous efficiency of LED, and focuses on the key technologies in the preparation of patterned sapphire substrates, including the preparation of mask and graphic transfer technology, as well as two main methods of substrate preparation are: dry etching and wet corrosion, and the advantages and disadvantages of the two preparation methods are compared. Finally, it is pointed out that the nano-patterned sapphire substrate is the key development direction of the future.
文章引用：赖志远, 仇凯弘, 侯想, 张江涛, 胡中伟. 图案化蓝宝石衬底的制备方法及关键技术分析[J]. 材料科学, 2020, 10(1): 63-74. https://doi.org/10.12677/MS.2020.101009

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https://resources.made-in-china.com/article/product-industry-knowledge/GmJECYrlzQDp/Sapphire-Wafer-Wet-Vs-Dry-Etching

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