PVD法制备超薄取向高硅钢织构与磁性能工艺研究

Texture Evolution and Magnetic Properties of Ultra-Thin Grain-Oriented High Silicon Electrical Steel Fabricated by Physical Vapor Deposition Method

摘要: 本文以3.0 wt.% Si冷轧取向硅钢超薄带为初始原料，采用磁控溅射技术在超薄带表面沉积高浓度硅涂层，后续借助扩散退火工艺，成功地制备了0.08 mm厚、具有高磁性能的取向高硅钢超薄带，在此过程中系统地研究了硅钢薄带组织和织构的演变规律。研究结果表明，随着退火温度的升高，硅钢薄带基体的平均硅浓度急剧上升，当退火温度升温至950℃到1150℃之间时，硅钢薄带基体硅的平均浓度稳定在6.3 wt.%。硅钢薄带在扩散退火过程中主要发生了一次再结晶和二次再结晶。随着扩散退火温度的升高，Goss织构的强度先上升后下降。当退火950℃时，Goss织构强度最高，磁性能最佳，其磁性能远高于CVD法和铸轧法制备的取向高硅钢。本研究可以为超薄取向高硅钢的制备及其磁性能优化提供新思路和方法。

Abstract: 0.08 mm-thick ultrathin grain-oriented high silicon electrical steel sheets were successfully produced by physical vapor deposition method. Using 3.0 wt.% Si cold rolled oriented silicon steel ultrathin strip as the initial raw material, the coating with high silicon concentration was firstly deposited on the surface of ultra thin strip substrate by magnetron sputtering technique and then post-annealed at different temperatures. The texture evolution and magnetic properties during siliconizing processing were systematically investigated. The results shows that with the increasing of annealing temperatures, the average silicon concentration of substrate rises sharply, when the annealing temperature ranges from 950°C to 1150°C, the average silicon concentration of substrate is stable at 6.3 wt.%. Primary recrystallization and secondary recrystallization were the main processes that occurred during annealing. With the increasing of annealing temperature, the strength of Goss texture firstly rises and then declines. At 950°C, Goss has the highest texture strength and the best magnetic properties, and its magnetic properties are much higher than those of high silicon steel prepared by CVD and cast rolling methods. This study provides a new approach and method for the preparation and optimization of magnetic properties of ultrathin grain-oriented high silicon steel.