WO3薄膜的特性研究进展
Research Progress on Properties of WO3 Thin Films
DOI: 10.12677/japc.2025.141006, PDF,    国家自然科学基金支持
作者: 周金辉, 张 驰, 谭付越洋, 郭钲杰, 陈 洁, 杨璨源, 赵志斌, 李昕洋, 徐东昕, 李再金*：海南省激光技术与光电功能材料重点实验室，海南省院士团队创新中心，半导体激光海南省国际联合研究中心，海南师范大学物理与电子工程学院，海南 海口
关键词: 氧化钨薄膜；电致变色；制备技术；WO3 Thin Film； Electrochromism； Preparation Technology
摘要: 本文介绍了WO3薄膜电致变色机理，总结了电致变色器件的性能四项评价指标：光学调制幅度、响应时间、着色效率和循环稳定性，其中光学调制幅度是评价电致变色器件性能的关键参数。概述了WO3薄膜四种主要制备技术：溶胶–凝胶技术、电化学沉积技术、电子束蒸发技术和磁控溅射技术，并综述了近几年使用这几种技术制备WO3薄膜的研究工作，通过对比分析，磁控溅射技术制备的WO3薄膜附着力强，光学调制幅度高，循环稳定性好，是最有前景的一项WO3薄膜制备技术。最后，文章对该电致变色技术领域未来的研究方向进行了展望：柔性衬底以及全固态电解质可能会被广泛使用。
Abstract: In this paper, the electrochromic mechanism of WO3 thin films is introduced, and four evaluation indexes of the performance of electrochromic devices are summarized: optical modulation amplitude, response time, coloring efficiency and cycling stability, among which optical modulation amplitude is the key parameter to evaluate the performance of electrochromic devices. This paper summarizes the four main preparation technologies of WO3 films: sol-gel technology, electrochemical deposition technology, electron beam evaporation technology and magnetron sputtering technology, and summarizes the research work on the preparation of WO3 films using these technologies in recent years. Finally, the paper looks forward to future research in the field of electrochromic technology, where flexible substrates and all-solid-state electrolytes may be widely used.
文章引用：周金辉, 张驰, 谭付越洋, 郭钲杰, 陈洁, 杨璨源, 赵志斌, 李昕洋, 徐东昕, 李再金. WO3薄膜的特性研究进展[J]. 物理化学进展, 2025, 14(1): 59-71. https://doi.org/10.12677/japc.2025.141006

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