梯度沉积时间及热处理温度对于氧化镍电致变色性能的影响

Influence of Gradient Deposition Time and Heat Treatment Temperature on the Electrochromic Properties of Nickel Oxide

摘要: 本研究采用化学浴沉积法在FTO导电玻璃基底上制备氧化镍薄膜，通过控制沉积时间(8~14 min)，探究沉积时间对氧化镍薄膜电致变色性能的影响规律。实验结果表明，沉积时间为10 min时，氧化镍(NiO)薄膜展现出优异的电致变色性能，高光学对比度(532 nm处为68.7%)、高着色效率(52.6 cm²/C)、快速响应速度(着色时间1.6 s、褪色时间2.8 s)、电荷转移电阻低(20.58 Ω)，电致变色关键性能在各沉积时间样品中最优。在此基础上，固定沉积时间为10 min，只改变退火温度，实验结果表明，当退火温度为350℃时，NiO薄膜电致变色活性最高，但是其在2000圈循环后对比度降低了36.2%。而当退火温度为550℃时，NiO薄膜电致变色活性有所降低，但是在2000圈循环后对比度仅降低了17.3%，显示出较强的循环稳定性。

Abstract: This study employed the chemical bath deposition method to fabricate nickel oxide thin films on FTO conductive glass substrates. By controlling the deposition time (8~14 minutes), the influence of deposition duration on the electrochromic properties of nickel oxide films was systematically investigated. Experimental results demonstrate that the nickel oxide (NiO) film deposited for 10 minutes exhibits superior electrochromic performance, characterized by high optical contrast (68.7% at 532 nm), excellent coloration efficiency (52.6 cm²/C), rapid response time (coloration time of 1.6 s and bleaching time of 2.8 s), and low charge transfer resistance (20.58 Ω), representing optimal electrochromic properties among all deposition time samples. Subsequently, with the deposition time fixed at 10 minutes, the annealing temperature was varied. Experimental findings reveal that the NiO film annealed at 350˚C demonstrates the highest electrochromic activity, although its optical contrast decreases by 36.2% after 2000 cycles. In contrast, the NiO film annealed at 550˚C shows slightly reduced electrochromic activity but maintains better cycling stability, with only a 17.3% decrease in optical contrast after 2000 cycles.