两种钼靶材溅射钼薄膜的组织性能研究
Study on Microstructure and Properties of Mo Thin Films Sputtered by Two Kinds of Mo Targets
DOI: 10.12677/MS.2018.86084, PDF,  被引量    科研立项经费支持
作者: 安 耿, 孙 军：西安交通大学金属强度国家重点实验室，陕西 西安；刘仁智, 李 晶, 曹维成：金堆城钼业股份有限公司技术中心，陕西 西安
关键词: 钼靶材；溅射；钼薄膜；微观组织；性能；Mo Target； Sputtering； Mo Film； Microstructure； Property
摘要: 将两种不同微观组织的钼靶材在同样的溅射工艺下进行薄膜溅射，通过溅射后钼靶材和钼溅射薄膜的表面形貌观察以及钼薄膜厚度、方阻及结晶取向的测试，探讨了靶材微观组织对薄膜性能的影响。结果表明，靶材的微观组织对钼薄膜的性能有着较大的影响，晶粒组织细小均匀的钼靶材有助于钼薄膜沉积速率的提高，同时有利于组织均匀、表面平整以及厚度和方阻分布均匀的钼薄膜的形成；两种钼靶材溅射形成的钼薄膜均呈现明显的(110)择优取向，钼靶材微观组织的差异对溅射薄膜的结晶取向没有显著的影响。
Abstract: Under the same sputtering process, two kinds of molybdenum (Mo) targets with different micro-structures were selected to sputter Mo thin films. Surface morphologies of sputtered Mo-targets and Mo thin films were observed, and thickness, sheet resistance and grain orientation of Mo thin films were measured. The effect of microstructure of Mo target on properties of Mo thin film was discussed. The results show that the microstructure of Mo target has a great influence on the properties of Mo thin films. Using Mo target with uniform and fine grain structures，it is helpful for increasing of deposition rate of Mo thin film, and is also beneficial to get the Mo thin film with uni-form microstructure, flat surface and well distributed thickness and sheet resistance. Mo thin films sputtered by two kinds of Mo targets all present (110) preferred orientation, and the micro-structure difference of Mo target has not obvious influence on grain orientation of sputtering film.
文章引用：安耿, 孙军, 刘仁智, 李晶, 曹维成. 两种钼靶材溅射钼薄膜的组织性能研究[J]. 材料科学, 2018, 8(6): 709-717. https://doi.org/10.12677/MS.2018.86084

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