标题:
多晶Si酸制绒刻蚀稳定性的研究Research on Acid Texturing Stability of
Multi-Crystalline Wafer
作者:
冯宇俊, 梁玉玉, 焦朋府, 张超, 贾彦科, 王森涛
关键字:
多晶硅, 酸制绒, 刻蚀稳定性Multi-Crystalline Silicon; Acid Texturing; Etching Stability
期刊名称:
《Optoelectronics》, Vol.4 No.1, 2014-02-12
摘要:
多晶Si酸制绒刻蚀稳定性对制绒工艺有重要的影响。本文主要研究酸刻蚀量在横向和纵向的不同，结合槽体内部分析液体流向分布对刻蚀稳定性的影响，强调设备结构设计对工艺稳定性影响的重要性。
The stability of etch depth of multi-crystalline silicon plays an important role in acid texturing process. In this paper, differences of horizontal and vertical etch depths were discussed. Combing with the analysis of the chemical flow direction’s influence on acid texturing etching stability, this paper emphasized the importance of the equipment structure’s design to the process stability.